High performance negative capacitance field-effect transistor featuring low off-state current, high on/off current ratio, and steep sub-60 mV dec-1 swing

Chien Liu, Hsuan Han Chen, Yi Chun Tung, Wei Chun Wang, Zhong Ying Huang, Bing Yang Shih, Szu Yen Hsiung, Shih An Wang, Yu Chi Fan, Tsung Ming Lee, Chien Liang Lin, Zi You Huang, Hsiu Ming Liu, Sheng Lee, Wu Ching Chou, Chun Hu Cheng, Hsiao Hsuan Hsu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

In this work, we demonstrated that the 5-nm-thick HfAlO x negative capacitance transistor (NCFET) with optimized Al doping can achieve a minimum 33 mV dec-1 subthreshold swing (SS), an ultralow I off of 7.44 fA μm-1, and a high I on /I off ratio of 1.9 108. The NC switching with sub-60 mV dec-1 SS can be implemented from V DS = 0.2 V to 0.8 V due to an ultralow off-state leakage current. The experimental results reveal that well-controlled Al doping in HfAlO x not only reduces off-state leakage of the transistor, but also improves the ferroelectric NC effect to achieve a sub-60 mV dec-1 switching under a favorably low sub-1 voltage. This scaled HfAlO x NCFET with optimized Al doping and fluorine defect passivation shows the great potential for the application of low power logic devices.

Original languageEnglish
Article numberSGGA01
JournalJapanese Journal of Applied Physics
Volume59
Issue numberSG
DOIs
Publication statusPublished - 2020 Apr 1

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy

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