High density and low leakage current in TiO2 MIM capacitors processed at 300°C

C. H. Cheng*, S. H. Lin, K. Y. Jhou, W. J. Chen, C. P. Chou, F. S. Yeh, Jim Hu, M. Hwang, T. Arikado, Sean P. McAlister, Albert Chin

*Corresponding author for this work

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