Growth of high-quality SiGe films with a buffer layer containing Ge quantum dots

S. W. Lee, P. S. Chen, T. Y. Chien, L. J. Chen, Chi-Ta Chia, C. W. Liu

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

High-quality SiGe films with a buffer layer containing Ge quantum dots have been grown by ultra-high vacuum chemical vapor deposition. For Ge dots/Si bilayers up to 10 periods, threading dislocation density and the residual strain in the SiGe uniform epilayers were found to reduce drastically with the increasing period. The Si0.8Ge0.2 film grown on a 10-period Ge dots/Si bilayers was demonstrated to have a threading dislocation density of 2.0 × 105 cm- 2 with a residual strain of only 11%. Strained-Si n-channel metal-oxide-semiconductor transistors with various buffer layers were fabricated and examined. Effective electron mobility for the strained-Si device with the multiple Ge quantum dots buffer layer was found to be 90% higher than that of Si control device. The scheme for the formation of the relaxed SiGe film serving as a virtual substrate shall be applicable to high-speed strained-Si devices.

Original languageEnglish
Pages (from-to)120-123
Number of pages4
JournalThin Solid Films
Volume508
Issue number1-2
DOIs
Publication statusPublished - 2006 Jun 5

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Keywords

  • Self-assembled quantum dots
  • SiGe films
  • UHV/CVD

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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