INIS
surfaces
100%
films
100%
layers
100%
growth
100%
temperature range 0273-0400 k
100%
suppression
100%
low temperature
100%
magnetism
100%
silicides
100%
interfaces
66%
anisotropy
66%
comparative evaluations
33%
volume
33%
deposition
33%
morphology
33%
annealing
33%
coercive force
33%
roughness
33%
segregation
33%
Chemistry
Surface
100%
Ambient Reaction Temperature
100%
Reaction Temperature
100%
Liquid Film
100%
Monolayer
100%
Magnetism
100%
Silicide
100%
Magnetic Anisotropy
66%
Volume
33%
Magnetic Coercivity
33%
Roughness
33%
Annealing
33%
Physics
Room Temperature
100%
Temperature
100%
Retarding
100%
Growth
100%
Magnetism
100%
Magnetic Anisotropy
66%
Model
33%
Volume
33%
Deposition
33%
Domains
33%
Annealing
33%
Coercivity
33%
Roughness
33%
Flat Surfaces
33%
Material Science
Temperature
100%
Magnetism
100%
Monolayers
60%
Surface
40%
Anisotropy
40%
Annealing
20%
Surface Morphology
20%