Geometric variation: A novel approach to examine the surface roughness and the line roughness effects in trigate FinFETs

E. R. Hsieh, Y. C. Fan, C. H. Liu, Steve S. Chung, R. M. Huang, C. T. Tsai, T. R. Yew

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science