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Geometric variation: A novel approach to examine the surface roughness and the line roughness effects in trigate FinFETs

  • E. R. Hsieh
  • , Y. C. Fan
  • , C. H. Liu
  • , Steve S. Chung
  • , R. M. Huang
  • , C. T. Tsai
  • , T. R. Yew

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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