Geometric variation: A novel approach to examine the surface roughness and the line roughness effects in trigate FinFETs
- E. R. Hsieh
- , Y. C. Fan
- , C. H. Liu
- , Steve S. Chung
- , R. M. Huang
- , C. T. Tsai
- , T. R. Yew
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution