Finely Tunable Surface Wettability by Two-Dimensional Molecular Manipulation

Chong You Chen, Hsiang Hua Li, Hsiao Yuan Chu, Chang Ming Wang, Che Wei Chang, Li En Lin, Cheng Chih Hsu, Wei Ssu Liao*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Local molecular environment governs material interface properties, especially the substrate's exposing behavior and overall functionality expression. Although current techniques can provide efficient surface property modification, challenges in molecule spatial distribution and composition controls limited the generation of homogeneous and finely tunable molecular environment. In this study, Au-thiolate rupturing operation in chemical lift-off lithography (CLL) is used to manipulate the substrate interface molecular environment. The creation of randomly distributed artificial self-assembled monolayer defects generates vacancies for substrate property modification through back-insertion of molecules with opposite functionalities. Surface wettability adjustment is utilized as an example, where well-controllable molecule distribution provides finely tunable substrate affinity toward liquids with different physical properties. The distinct property difference between two surface regions assists microdroplet formation when liquids flow through, not only water solution but also low-surface-tension organic liquids. These microdroplet arrays become a template to guide material assembly in its formation process and act as pH-sensitive platforms for high-throughput detection. Furthermore, the tunability of the molecular pattern in this approach helps minimize the coffee-ring effect and the sweet-spot issue in matrix-assisted laser desorption/ionization mass spectrometry. Two-dimensional molecular manipulation in the CLL operation, therefore, holds the capability toward controlling homogeneous material surface property and toward exhibiting behavior adjustments.

Original languageEnglish
Pages (from-to)41814-41823
Number of pages10
JournalACS Applied Materials and Interfaces
Volume10
Issue number48
DOIs
Publication statusPublished - 2018 Dec 5
Externally publishedYes

Keywords

  • chemical lift-off lithography
  • matrix-assisted laser desorption/ionization time-of-flight mass spectrometry
  • microdroplet
  • molecular manipulation
  • self-assembled monolayer
  • sensing
  • surface modification

ASJC Scopus subject areas

  • General Materials Science

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