Abstract
Atomic layer deposition (ALD)-based TiN electrode on ferroelectric HfZrO2 metal/ferroelectric/metal (MFM) capacitor and ferroelectric field-effect transistor (FeFET) is demonstrated experimentally with weight transfer, that is, $\Delta {P}$ , per pulse analysis through consecutive alternating potentiation/depression (Pot./Dep.) training pulses. The weight training pulse schemes are studied to have symmetric and linear synapse weight transfer to increase the accuracy and accelerate the deep neural network (DNN) training. With ALD TiN inserted, $\alpha _{p} / \alpha _{d} = -0.63$ / -0.84, asymmetry $\vert \alpha _{p} - \alpha _{d}\vert =0.21$ , and polarization modulation ratio (Pot./Dep.) = 97%/98% are achieved for MFM capacitor, and $\alpha _{p} / \alpha _{d} = -1.32$ / -1.88, asymmetry $\vert \alpha _{p} - \alpha _{d}\vert =0.56$ , and $G_{\text {max}} / G_{\text {min}} > 10\times $ are delivered for FeFET.
Original language | English |
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Article number | 9180313 |
Pages (from-to) | 4201-4207 |
Number of pages | 7 |
Journal | IEEE Transactions on Electron Devices |
Volume | 67 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2020 Oct |
Keywords
- Ferroelectric memories
- hafnium
- neural networks
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering