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Ferroelectric Characteristics of Ultra-thin Hf1-xZrxO2 Gate Stack and 1T Memory Operation Applications
M. H. Lee, C. Y. Kuo, C. H. Tang, H. H. Chen, C. Y. Liao, R. C. Hong, S. S. Gu, Y. C. Chou, Z. Y. Wang, S. Y. Chen, P. G. Chen, M. H. Liao, K. S. Li
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
2
Citations
(Scopus)