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Dive into the research topics of 'Ferroelectric Al:HfO2 negative capacitance FETs'. Together they form a unique fingerprint.- Sort by
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M. H. Lee, P. G. Chen, S. T. Fan, Y. C. Chou, C. Y. Kuo, C. H. Tang, H. H. Chen, S. S. Gu, R. C. Hong, Z. Y. Wang, S. Y. Chen, C. Y. Liao, K. T. Chen, S. T. Chang, M. H. Liao, K. S. Li, C. W. Liu
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution