TY - GEN
T1 - Fabrication of silicon nanopillars array for developing PCs sensor
AU - Huang, Mao Jung
AU - Yang, Chii Rong
AU - Su, Chien Ying
AU - Shiao, Ming Hua
PY - 2013
Y1 - 2013
N2 - This study proposed the use of combined nano-sphere lithography (NSL) and photo-assisted electrochemical etching (PAECE) to generate arrayed nano-pillar with high aspect ratio on silicon wafer, and then used for the application of photonic crystals (PCs) Sensor. The experiment result indicates the NSL can conveniently define nano-array and PAECE technique can effectively yield nano-pores and nano-pillars. The nano-pore, depth of 2.3 μm and diameter of 90 nm, was generated by 1 V PAECE. When the bias of PAECE was enlarged to 2.2 V, nano-pillar array was produced with 2 μm in height, 100 nm in diameter and 201 for aspect ratio. The PCs sensor detection platform was composed by laser of 1550 nm, precision translation stage and polarimeter. Through this high sensitive system, we can examine the small bio-molecules of plasmid by means of the polarized variation represented in Poincarè sphere coordinate system.
AB - This study proposed the use of combined nano-sphere lithography (NSL) and photo-assisted electrochemical etching (PAECE) to generate arrayed nano-pillar with high aspect ratio on silicon wafer, and then used for the application of photonic crystals (PCs) Sensor. The experiment result indicates the NSL can conveniently define nano-array and PAECE technique can effectively yield nano-pores and nano-pillars. The nano-pore, depth of 2.3 μm and diameter of 90 nm, was generated by 1 V PAECE. When the bias of PAECE was enlarged to 2.2 V, nano-pillar array was produced with 2 μm in height, 100 nm in diameter and 201 for aspect ratio. The PCs sensor detection platform was composed by laser of 1550 nm, precision translation stage and polarimeter. Through this high sensitive system, we can examine the small bio-molecules of plasmid by means of the polarized variation represented in Poincarè sphere coordinate system.
KW - biosensor
KW - nano-pillar
KW - nano-sphere lithography
KW - photoelectrochemical etching
UR - http://www.scopus.com/inward/record.url?scp=84883119455&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84883119455&partnerID=8YFLogxK
U2 - 10.1109/NEMS.2013.6559723
DO - 10.1109/NEMS.2013.6559723
M3 - Conference contribution
AN - SCOPUS:84883119455
SN - 9781467363525
T3 - 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
SP - 237
EP - 241
BT - 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
T2 - 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
Y2 - 7 April 2013 through 10 April 2013
ER -