Fabrication of glass micro-prisms using ultra-fast laser pulses with chemical etching process

Shao Wei Luo; Tien Li Chang; Hung Yin Tsai

doi:10.1016/j.optlaseng.2011.08.013

Fabrication of glass micro-prisms using ultra-fast laser pulses with chemical etching process

Shao Wei Luo, Tien Li Chang^*, Hung Yin Tsai

^*Corresponding author for this work

Department of Mechatronic Engineering

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

In this study, a new process of glass micro-prism structures is investigated by an ultra-fast laser irradiation with chemical etching process. The ultra-fast laser is employed by an all-in-one femtosecond laser (FS-laser) system with the amplifier as an excitation source for patterning the structures. Here, the center wavelength of laser is frequency-doubled to 517 nm. Besides, the repetition rate and pulse width of laser are 100 kHz and 350 fs, respectively. First, the embedded gratings of glass with different pitches can be fabricated using a FS-laser process. Afterwards, the glass samples are placed in the hydrofluoric acid (HF) solution for 15 min to develop structures. Finally, the results of this study demonstrated that the V-cut micro-prisms are successfully formed by controlling etching concentration between intrinsic glass material and modified areas.

Original language	English
Pages (from-to)	220-225
Number of pages	6
Journal	Optics and Lasers in Engineering
Volume	50
Issue number	2
DOIs	https://doi.org/10.1016/j.optlaseng.2011.08.013
Publication status	Published - 2012 Feb

Keywords

Chemical etching
Ultra-fast laser
V-cut micro-prisms

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Mechanical Engineering
Electrical and Electronic Engineering

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10.1016/j.optlaseng.2011.08.013

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title = "Fabrication of glass micro-prisms using ultra-fast laser pulses with chemical etching process",

abstract = "In this study, a new process of glass micro-prism structures is investigated by an ultra-fast laser irradiation with chemical etching process. The ultra-fast laser is employed by an all-in-one femtosecond laser (FS-laser) system with the amplifier as an excitation source for patterning the structures. Here, the center wavelength of laser is frequency-doubled to 517 nm. Besides, the repetition rate and pulse width of laser are 100 kHz and 350 fs, respectively. First, the embedded gratings of glass with different pitches can be fabricated using a FS-laser process. Afterwards, the glass samples are placed in the hydrofluoric acid (HF) solution for 15 min to develop structures. Finally, the results of this study demonstrated that the V-cut micro-prisms are successfully formed by controlling etching concentration between intrinsic glass material and modified areas.",

keywords = "Chemical etching, Ultra-fast laser, V-cut micro-prisms",

author = "Luo, {Shao Wei} and Chang, {Tien Li} and Tsai, {Hung Yin}",

note = "Funding Information: This work was funded by National Science Council in Taiwan . The authors would like to thank to Dr. Min-Chieh Chou, Dr. Han-Ping Yang, Dr. Hung-Yi Lin and Mr. Wen-Lang Lai from Mechanical and Systems Research Laboratories at Industrial Technology Research Institute, for their advices and discussions on laser studies.",

year = "2012",

month = feb,

doi = "10.1016/j.optlaseng.2011.08.013",

language = "English",

volume = "50",

pages = "220--225",

journal = "Optics and Lasers in Engineering",

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AU - Luo, Shao Wei

AU - Chang, Tien Li

AU - Tsai, Hung Yin

N1 - Funding Information: This work was funded by National Science Council in Taiwan . The authors would like to thank to Dr. Min-Chieh Chou, Dr. Han-Ping Yang, Dr. Hung-Yi Lin and Mr. Wen-Lang Lai from Mechanical and Systems Research Laboratories at Industrial Technology Research Institute, for their advices and discussions on laser studies.

PY - 2012/2

Y1 - 2012/2

N2 - In this study, a new process of glass micro-prism structures is investigated by an ultra-fast laser irradiation with chemical etching process. The ultra-fast laser is employed by an all-in-one femtosecond laser (FS-laser) system with the amplifier as an excitation source for patterning the structures. Here, the center wavelength of laser is frequency-doubled to 517 nm. Besides, the repetition rate and pulse width of laser are 100 kHz and 350 fs, respectively. First, the embedded gratings of glass with different pitches can be fabricated using a FS-laser process. Afterwards, the glass samples are placed in the hydrofluoric acid (HF) solution for 15 min to develop structures. Finally, the results of this study demonstrated that the V-cut micro-prisms are successfully formed by controlling etching concentration between intrinsic glass material and modified areas.

AB - In this study, a new process of glass micro-prism structures is investigated by an ultra-fast laser irradiation with chemical etching process. The ultra-fast laser is employed by an all-in-one femtosecond laser (FS-laser) system with the amplifier as an excitation source for patterning the structures. Here, the center wavelength of laser is frequency-doubled to 517 nm. Besides, the repetition rate and pulse width of laser are 100 kHz and 350 fs, respectively. First, the embedded gratings of glass with different pitches can be fabricated using a FS-laser process. Afterwards, the glass samples are placed in the hydrofluoric acid (HF) solution for 15 min to develop structures. Finally, the results of this study demonstrated that the V-cut micro-prisms are successfully formed by controlling etching concentration between intrinsic glass material and modified areas.

KW - Chemical etching

KW - Ultra-fast laser

KW - V-cut micro-prisms

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Fabrication of glass micro-prisms using ultra-fast laser pulses with chemical etching process

Abstract

Keywords

ASJC Scopus subject areas

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