Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Tien Li Chang*, Shao Wei Luo, Han Ping Yang, Chi Hung Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)


This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

Original languageEnglish
Pages (from-to)1344-1347
Number of pages4
JournalMicroelectronic Engineering
Issue number5-8
Publication statusPublished - 2010 May
Externally publishedYes


  • Diffraction grating
  • Femtosecond laser
  • Micromachining
  • PDMS

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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