Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Tien Li Chang; Shao Wei Luo; Han Ping Yang; Chi Hung Lee

doi:10.1016/j.mee.2009.12.037

Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Tien Li Chang^*, Shao Wei Luo, Han Ping Yang, Chi Hung Lee

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

23 Citations (Scopus)

Abstract

This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

Original language	English
Pages (from-to)	1344-1347
Number of pages	4
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.12.037
Publication status	Published - 2010 May
Externally published	Yes

Keywords

Diffraction grating
Femtosecond laser
Micromachining
PDMS

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

Access to Document

10.1016/j.mee.2009.12.037

Cite this

@article{bb5082ca68c14aecbbb2526f232e2733,

title = "Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining",

abstract = "This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown",

keywords = "Diffraction grating, Femtosecond laser, Micromachining, PDMS",

author = "Chang, {Tien Li} and Luo, {Shao Wei} and Yang, {Han Ping} and Lee, {Chi Hung}",

year = "2010",

month = may,

doi = "10.1016/j.mee.2009.12.037",

language = "English",

volume = "87",

pages = "1344--1347",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "5-8",

}

TY - JOUR

T1 - Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

AU - Chang, Tien Li

AU - Luo, Shao Wei

AU - Yang, Han Ping

AU - Lee, Chi Hung

PY - 2010/5

Y1 - 2010/5

N2 - This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

AB - This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure. Crown

KW - Diffraction grating

KW - Femtosecond laser

KW - Micromachining

KW - PDMS

UR - http://www.scopus.com/inward/record.url?scp=76949084899&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=76949084899&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2009.12.037

DO - 10.1016/j.mee.2009.12.037

M3 - Article

AN - SCOPUS:76949084899

SN - 0167-9317

VL - 87

SP - 1344

EP - 1347

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachining

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this