Fabrication of antireflection structures on TCO film for reflective liquid crystal display

Ta Hsin Chou, Kuei Yuan Cheng, Tien Li Chang, Chia Jen Ting, Hsiu Chen Hsu, Chin Jyi Wu, Jen Hui Tsai, Tzn Yu Huang

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

The cholesteric liquid crystals display (ChLCD) is one kind of reflective liquid crystal display, the antireflective layer on its transparent conduction oxides (TCO) film is needed for good contrast and color performance. In this study, the finite difference time domain (FDTD) simulation and nanoimprinting fabrication of AR structures on the TCO film are developed. Finally, the reflectance of AR structures on TCO film is just half of the original film, and this result is useful for the reflective ChLCD product commercialized in the future. Crown

Original languageEnglish
Pages (from-to)628-631
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number4-6
DOIs
Publication statusPublished - 2009 Apr 1
Externally publishedYes

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Keywords

  • Antireflection
  • Nanoimprint
  • Transparent conduction oxides film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Chou, T. H., Cheng, K. Y., Chang, T. L., Ting, C. J., Hsu, H. C., Wu, C. J., Tsai, J. H., & Huang, T. Y. (2009). Fabrication of antireflection structures on TCO film for reflective liquid crystal display. Microelectronic Engineering, 86(4-6), 628-631. https://doi.org/10.1016/j.mee.2009.01.067