Abstract
The study presents a combination of self-assembled nanosphere lithography (SANL) and photo-assisted electrochemical etching (PAECE) to cost-effectively form an arrayed nanostructure on the silicon wafer. The aspect ratio of the pores in this nanoarray fabricated through PAECE is around 22:1. Tuning the etching voltage can convert the nanopore array to a nanopillar array with an aspect ratio of about 20:1. Finally, a two-staged PAECE is used to produce a nanopillar arrays for the production of fuel cell electrodes. Its reaction current of 10.2 mA is 72.9 times higher than that obtained by a planar electrode.
Original language | English |
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Article number | 045003 |
Journal | Journal of Micromechanics and Microengineering |
Volume | 19 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2009 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials
- Mechanical Engineering
- Electrical and Electronic Engineering