The study presents a combination of self-assembled nanosphere lithography (SANL) and photo-assisted electrochemical etching (PAECE) to cost-effectively form an arrayed nanostructure on the silicon wafer. The aspect ratio of the pores in this nanoarray fabricated through PAECE is around 22:1. Tuning the etching voltage can convert the nanopore array to a nanopillar array with an aspect ratio of about 20:1. Finally, a two-staged PAECE is used to produce a nanopillar arrays for the production of fuel cell electrodes. Its reaction current of 10.2 mA is 72.9 times higher than that obtained by a planar electrode.
ASJC Scopus subject areas
- Mechanical Engineering
- Electrical and Electronic Engineering
- Mechanics of Materials
- Electronic, Optical and Magnetic Materials