Fabrication and characterization of Co(11̄00)/Mo(211) and Co(112̄0)/Mo(100) bilayered films on MgO

Y. D. Yao, Y. Liou, J. C.A. Huang, S. Y. Liao, I. Klik, C. P. Chang, Chi-Kuen Lo

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Co/Mo bilayered films have been successfully grown on MgO(100) and MgO(110) substrates by molecular beam epitaxy. According to the reflection high energy electron diffraction and x-ray diffraction measurements the crystal structure of the film depends on the orientation of the buffer and substrate. The growth of biaxial Co(112̄0)/Mo(100) on MgO(100) and of uniaxial Co(11̄00)/Mo(211) on MgO(11̄00) substrates has been confirmed. The anisotropic magnetoresistance (AMR) is strongly influenced by the Co orientation which is altered by growth on Mo/MgO(100) and MgO(110). In Co(112̄0)/Mo(100) on MgO(110) AMR is isotropic for all in-plane fields. However, for Co(11̄00)/Mo(211) on MgO(110) we observed enhancement of AMR along the easy axis at 10 °K.

Original languageEnglish
Pages (from-to)4669-4671
Number of pages3
JournalIEEE Transactions on Magnetics
Volume32
Issue number5 PART 2
DOIs
Publication statusPublished - 1996 Dec 1

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Enhanced magnetoresistance
Fabrication
Substrates
Reflection high energy electron diffraction
Molecular beam epitaxy
Crystal orientation
Buffers
Diffraction
Crystal structure
X rays

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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Fabrication and characterization of Co(11̄00)/Mo(211) and Co(112̄0)/Mo(100) bilayered films on MgO. / Yao, Y. D.; Liou, Y.; Huang, J. C.A.; Liao, S. Y.; Klik, I.; Chang, C. P.; Lo, Chi-Kuen.

In: IEEE Transactions on Magnetics, Vol. 32, No. 5 PART 2, 01.12.1996, p. 4669-4671.

Research output: Contribution to journalArticle

Yao, Y. D. ; Liou, Y. ; Huang, J. C.A. ; Liao, S. Y. ; Klik, I. ; Chang, C. P. ; Lo, Chi-Kuen. / Fabrication and characterization of Co(11̄00)/Mo(211) and Co(112̄0)/Mo(100) bilayered films on MgO. In: IEEE Transactions on Magnetics. 1996 ; Vol. 32, No. 5 PART 2. pp. 4669-4671.
@article{0c9ea37b1b1f488ab16cc1ca0ddf7bd1,
title = "Fabrication and characterization of Co(11̄00)/Mo(211) and Co(112̄0)/Mo(100) bilayered films on MgO",
abstract = "Co/Mo bilayered films have been successfully grown on MgO(100) and MgO(110) substrates by molecular beam epitaxy. According to the reflection high energy electron diffraction and x-ray diffraction measurements the crystal structure of the film depends on the orientation of the buffer and substrate. The growth of biaxial Co(112̄0)/Mo(100) on MgO(100) and of uniaxial Co(11̄00)/Mo(211) on MgO(11̄00) substrates has been confirmed. The anisotropic magnetoresistance (AMR) is strongly influenced by the Co orientation which is altered by growth on Mo/MgO(100) and MgO(110). In Co(112̄0)/Mo(100) on MgO(110) AMR is isotropic for all in-plane fields. However, for Co(11̄00)/Mo(211) on MgO(110) we observed enhancement of AMR along the easy axis at 10 °K.",
author = "Yao, {Y. D.} and Y. Liou and Huang, {J. C.A.} and Liao, {S. Y.} and I. Klik and Chang, {C. P.} and Chi-Kuen Lo",
year = "1996",
month = "12",
day = "1",
doi = "10.1109/20.539113",
language = "English",
volume = "32",
pages = "4669--4671",
journal = "IEEE Transactions on Magnetics",
issn = "0018-9464",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "5 PART 2",

}

TY - JOUR

T1 - Fabrication and characterization of Co(11̄00)/Mo(211) and Co(112̄0)/Mo(100) bilayered films on MgO

AU - Yao, Y. D.

AU - Liou, Y.

AU - Huang, J. C.A.

AU - Liao, S. Y.

AU - Klik, I.

AU - Chang, C. P.

AU - Lo, Chi-Kuen

PY - 1996/12/1

Y1 - 1996/12/1

N2 - Co/Mo bilayered films have been successfully grown on MgO(100) and MgO(110) substrates by molecular beam epitaxy. According to the reflection high energy electron diffraction and x-ray diffraction measurements the crystal structure of the film depends on the orientation of the buffer and substrate. The growth of biaxial Co(112̄0)/Mo(100) on MgO(100) and of uniaxial Co(11̄00)/Mo(211) on MgO(11̄00) substrates has been confirmed. The anisotropic magnetoresistance (AMR) is strongly influenced by the Co orientation which is altered by growth on Mo/MgO(100) and MgO(110). In Co(112̄0)/Mo(100) on MgO(110) AMR is isotropic for all in-plane fields. However, for Co(11̄00)/Mo(211) on MgO(110) we observed enhancement of AMR along the easy axis at 10 °K.

AB - Co/Mo bilayered films have been successfully grown on MgO(100) and MgO(110) substrates by molecular beam epitaxy. According to the reflection high energy electron diffraction and x-ray diffraction measurements the crystal structure of the film depends on the orientation of the buffer and substrate. The growth of biaxial Co(112̄0)/Mo(100) on MgO(100) and of uniaxial Co(11̄00)/Mo(211) on MgO(11̄00) substrates has been confirmed. The anisotropic magnetoresistance (AMR) is strongly influenced by the Co orientation which is altered by growth on Mo/MgO(100) and MgO(110). In Co(112̄0)/Mo(100) on MgO(110) AMR is isotropic for all in-plane fields. However, for Co(11̄00)/Mo(211) on MgO(110) we observed enhancement of AMR along the easy axis at 10 °K.

UR - http://www.scopus.com/inward/record.url?scp=0030245344&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030245344&partnerID=8YFLogxK

U2 - 10.1109/20.539113

DO - 10.1109/20.539113

M3 - Article

AN - SCOPUS:0030245344

VL - 32

SP - 4669

EP - 4671

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

SN - 0018-9464

IS - 5 PART 2

ER -