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Evaluation of temperature stability of trilayer resistive memories using work-function tuning
Chun Hu Cheng
, Albert Chin
Department of Mechatronic Engineering
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peer-review
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INIS
applications
50%
density
50%
distribution
100%
electric fields
50%
electrodes
50%
electrons
50%
energy
50%
evaluation
100%
high temperature
100%
operation
50%
performance
50%
speed
50%
stability
100%
titanium oxides
50%
tuning
100%
work functions
100%
Engineering
Applications
50%
Current Distribution
50%
Cycles
50%
Energy Engineering
50%
Evaluation
100%
Field Distribution
50%
Good Performance
50%
High Density
50%
High Temperature
100%
Nonvolatile Memory
50%
Resistive
100%
Stability
50%
Switching Speed
50%
Temperature Stability
100%
Titanium Dioxide
50%
Material Science
Density
33%
Durability
33%
Electrode
33%
Temperature
100%
Thermal Stability
33%