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Evaluation of temperature stability of trilayer resistive memories using work-function tuning
Chun Hu Cheng
, Albert Chin
Department of Mechatronic Engineering
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peer-review
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INIS
stability
100%
distribution
100%
evaluation
100%
work functions
100%
high temperature
100%
tuning
100%
performance
50%
applications
50%
energy
50%
density
50%
operation
50%
speed
50%
electrons
50%
electrodes
50%
titanium oxides
50%
electric fields
50%
Engineering
Evaluation
100%
Temperature Stability
100%
High Temperature
100%
Resistive
100%
Energy Engineering
50%
Stability
50%
Applications
50%
Cycles
50%
High Density
50%
Titanium Dioxide
50%
Good Performance
50%
Current Distribution
50%
Nonvolatile Memory
50%
Switching Speed
50%
Field Distribution
50%
Material Science
Temperature
100%
Density
33%
Electrode
33%
Durability
33%
Thermal Stability
33%