Enhancement of magnetoresistance in Co(1100)/Cr(211) bilayered films on MaO(110)

Y. D. Yao; Y. Liou; J. C.A. Huang; S. Y. Liao; I. Klik; W. T. Yang; C. P. Chang; C. K. Lo

doi:10.1063/1.361937

Enhancement of magnetoresistance in Co(1100)/Cr(211) bilayered films on MaO(110)

Y. D. Yao^*, Y. Liou, J. C.A. Huang, S. Y. Liao, I. Klik, W. T. Yang, C. P. Chang, C. K. Lo

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

Epitaxial Co/Cr bilayered films have been successfully grown on the MgO(100) and MgO(110) substrates by molecular-beam epitaxy. According to the reflection high-energy electron-diffraction and x-ray-diffraction measurements the crystal structure of the film depends on orientation of the buffer and substrate. Epitaxial growth of biaxial Co(1120)/Cr(100) on MgO(100) substrate and of uniaxial Co(1100)/Cr(211) on MgO(110) substrate has been confirmed. The anisotropy magnetoresistance (AMR) is strongly influenced by the orientation of the Cr buffer. In Co(1120)/Cr(100) on MgO(100) AMR is isotropic for all in-plane fields. However, for Co(1100)/Cr(211) on MgO(110) we observed enhancement of AMR along the easy axis for temperatures below 150 K, while along the hard axis AMR has a local maximum at about 150 K. The easy axis data suggest that the longitudinal spin density wave of Cr and the crystal anisotropy of Co on Cr(211) plane dominate the enhancement of the AMR.

Original language	English
Pages (from-to)	6533-6535
Number of pages	3
Journal	Journal of Applied Physics
Volume	79
Issue number	8 PART 2B
DOIs	https://doi.org/10.1063/1.361937
Publication status	Published - 1996 Apr 15
Externally published	Yes

ASJC Scopus subject areas

General Physics and Astronomy

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@article{efa124c3dbeb4510b8157e4e4dbd70a0,

title = "Enhancement of magnetoresistance in Co(1100)/Cr(211) bilayered films on MaO(110)",

abstract = "Epitaxial Co/Cr bilayered films have been successfully grown on the MgO(100) and MgO(110) substrates by molecular-beam epitaxy. According to the reflection high-energy electron-diffraction and x-ray-diffraction measurements the crystal structure of the film depends on orientation of the buffer and substrate. Epitaxial growth of biaxial Co(1120)/Cr(100) on MgO(100) substrate and of uniaxial Co(1100)/Cr(211) on MgO(110) substrate has been confirmed. The anisotropy magnetoresistance (AMR) is strongly influenced by the orientation of the Cr buffer. In Co(1120)/Cr(100) on MgO(100) AMR is isotropic for all in-plane fields. However, for Co(1100)/Cr(211) on MgO(110) we observed enhancement of AMR along the easy axis for temperatures below 150 K, while along the hard axis AMR has a local maximum at about 150 K. The easy axis data suggest that the longitudinal spin density wave of Cr and the crystal anisotropy of Co on Cr(211) plane dominate the enhancement of the AMR.",

author = "Yao, {Y. D.} and Y. Liou and Huang, {J. C.A.} and Liao, {S. Y.} and I. Klik and Yang, {W. T.} and Chang, {C. P.} and Lo, {C. K.}",

year = "1996",

month = apr,

day = "15",

doi = "10.1063/1.361937",

language = "English",

volume = "79",

pages = "6533--6535",

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T1 - Enhancement of magnetoresistance in Co(1100)/Cr(211) bilayered films on MaO(110)

AU - Yao, Y. D.

AU - Liou, Y.

AU - Huang, J. C.A.

AU - Liao, S. Y.

AU - Klik, I.

AU - Yang, W. T.

AU - Chang, C. P.

AU - Lo, C. K.

PY - 1996/4/15

Y1 - 1996/4/15

N2 - Epitaxial Co/Cr bilayered films have been successfully grown on the MgO(100) and MgO(110) substrates by molecular-beam epitaxy. According to the reflection high-energy electron-diffraction and x-ray-diffraction measurements the crystal structure of the film depends on orientation of the buffer and substrate. Epitaxial growth of biaxial Co(1120)/Cr(100) on MgO(100) substrate and of uniaxial Co(1100)/Cr(211) on MgO(110) substrate has been confirmed. The anisotropy magnetoresistance (AMR) is strongly influenced by the orientation of the Cr buffer. In Co(1120)/Cr(100) on MgO(100) AMR is isotropic for all in-plane fields. However, for Co(1100)/Cr(211) on MgO(110) we observed enhancement of AMR along the easy axis for temperatures below 150 K, while along the hard axis AMR has a local maximum at about 150 K. The easy axis data suggest that the longitudinal spin density wave of Cr and the crystal anisotropy of Co on Cr(211) plane dominate the enhancement of the AMR.

AB - Epitaxial Co/Cr bilayered films have been successfully grown on the MgO(100) and MgO(110) substrates by molecular-beam epitaxy. According to the reflection high-energy electron-diffraction and x-ray-diffraction measurements the crystal structure of the film depends on orientation of the buffer and substrate. Epitaxial growth of biaxial Co(1120)/Cr(100) on MgO(100) substrate and of uniaxial Co(1100)/Cr(211) on MgO(110) substrate has been confirmed. The anisotropy magnetoresistance (AMR) is strongly influenced by the orientation of the Cr buffer. In Co(1120)/Cr(100) on MgO(100) AMR is isotropic for all in-plane fields. However, for Co(1100)/Cr(211) on MgO(110) we observed enhancement of AMR along the easy axis for temperatures below 150 K, while along the hard axis AMR has a local maximum at about 150 K. The easy axis data suggest that the longitudinal spin density wave of Cr and the crystal anisotropy of Co on Cr(211) plane dominate the enhancement of the AMR.

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Enhancement of magnetoresistance in Co(1100)/Cr(211) bilayered films on MaO(110)

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