Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

Hsin Hsien Chen; Hong Chang Yang; Herng Er Horng; Y. Y. Lee; Shu Hsien Liao; S. Y. Yang; Chung Hsien Chou; Lieh Jeng Chang; M. J. Chen; M. Y. Chern

doi:10.1103/PhysRevA.81.033422

Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

Hsin Hsien Chen, Hong Chang Yang^*, Herng Er Horng, Y. Y. Lee, Shu Hsien Liao, S. Y. Yang, Chung Hsien Chou, Lieh Jeng Chang, M. J. Chen, M. Y. Chern

^*Corresponding author for this work

Undergraduate Program of Electro-Optical Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.

Original language	English
Article number	033422
Journal	Physical Review A - Atomic, Molecular, and Optical Physics
Volume	81
Issue number	3
DOIs	https://doi.org/10.1103/PhysRevA.81.033422
Publication status	Published - 2010 Mar 26

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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10.1103/PhysRevA.81.033422

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title = "Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4",

abstract = "This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.",

author = "Chen, {Hsin Hsien} and Yang, {Hong Chang} and Horng, {Herng Er} and Lee, {Y. Y.} and Liao, {Shu Hsien} and Yang, {S. Y.} and Chou, {Chung Hsien} and Chang, {Lieh Jeng} and Chen, {M. J.} and Chern, {M. Y.}",

year = "2010",

month = mar,

day = "26",

doi = "10.1103/PhysRevA.81.033422",

language = "English",

volume = "81",

journal = "Physical Review A - Atomic, Molecular, and Optical Physics",

issn = "1050-2947",

publisher = "American Physical Society",

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TY - JOUR

T1 - Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

AU - Chen, Hsin Hsien

AU - Yang, Hong Chang

AU - Horng, Herng Er

AU - Lee, Y. Y.

AU - Liao, Shu Hsien

AU - Yang, S. Y.

AU - Chou, Chung Hsien

AU - Chang, Lieh Jeng

AU - Chen, M. J.

AU - Chern, M. Y.

PY - 2010/3/26

Y1 - 2010/3/26

N2 - This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.

AB - This work reports an enhanced polarization and mechanisms in optically pumped (OP) hyperpolarized He3 in the presence of He4. The cells contain Rb metal, 60-torr N2, and different pressures of He3 and He4. In the absence of He4, the polarization of He3 increases monotonically from 4.5% to 8% when the pressure of He3 is increased from 300 to 1500 torr. In the presence of 1850-torr He4 gas, the polarization of He3 is enhanced from 7% to 30% for a cell containing 600-torr He3 and 60-torr N2. The wall relaxation factors X for OP cells with and without buffering He4 gas were derived. It was found that the He4 gas confines the He3 atoms to a diffusion-limited region which effectively reduces the wall relaxation factor X. Mechanisms contributed to relaxation are addressed and discussed.

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DO - 10.1103/PhysRevA.81.033422

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JO - Physical Review A - Atomic, Molecular, and Optical Physics

JF - Physical Review A - Atomic, Molecular, and Optical Physics

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M1 - 033422

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Enhanced polarization and mechanisms in optically pumped hyperpolarized He3 in the presence of He4

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