Energy-Efficient Versatile Memories with Ferroelectric Negative Capacitance by Gate-Strain Enhancement

Yu Chien Chiu, Chun Hu Cheng, Guan Lin Liou, Chun Yen Chang

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

In this brief, we reported a ferroelectric versatile memory with strained-gate engineering. The versatile memory with high-strain-gate showed a >40% improvement on ferroelectric hysteresis window, compared to low-strain case. The high compressive stress induced from high nitrogen-content TaN enhances monoclinic-to-orthorhombic phase transition to reach stronger ferrolectric polarization and lower depolarization field. The versatile memory featuring ferroelectric negative capacitance exhibited excellent transfer characteristics of the sub-60-mVdec subthreshold swing, ultralow off-state leakage of <1fA/μ m and > 108 on/off current ratio. Furthermore, the ferroelectric versatile memory can be switched by ±5 V under 20-ns speed for a long endurance cycling (1012 cycles). The low-power operation can be ascribed to the amplification of the surface potential to reach the strong inversion and fast domain polarization at the correspondingly low program/erase voltages.

Original languageEnglish
Article number7949049
Pages (from-to)3498-3501
Number of pages4
JournalIEEE Transactions on Electron Devices
Volume64
Issue number8
DOIs
Publication statusPublished - 2017 Aug

Fingerprint

Ferroelectric materials
Capacitance
Data storage equipment
Polarization
Depolarization
Surface potential
Compressive stress
Amplification
Hysteresis
Durability
Nitrogen
Phase transitions
Electric potential

Keywords

  • Charge trpapping
  • ferroelectric
  • multilevel
  • nonvolatile memory

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Energy-Efficient Versatile Memories with Ferroelectric Negative Capacitance by Gate-Strain Enhancement. / Chiu, Yu Chien; Cheng, Chun Hu; Liou, Guan Lin; Chang, Chun Yen.

In: IEEE Transactions on Electron Devices, Vol. 64, No. 8, 7949049, 08.2017, p. 3498-3501.

Research output: Contribution to journalArticle

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