Electrochromic properties and Raman spectroscopy analysis of tungsten oxide thin film by RF sputter

Chin Pao Cheng, Shi Hong Lin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This study utilizes tungsten oxide as the research subject and investigates changes between different argon/oxygen gas flow ratio and deposits on ITO substrates through RF reactively sputtering. Propylene carbonate (PC) is further mixed with LiClO 4 for the preparation of electrolyte. After packaged into components, electric voltage is applied to the films to generate reduction or oxidization, which can obtain different colored/bleached states. Lastly, Raman spectroscopy analysis is performed to get a greater understanding of electrochromic mechanisms. The results of the experiment discovered that as-deposited tungsten oxide thin film shows the formation of W +6 states, and the application of driving voltage causes the formation of W +6 states. At the same time, the thin film coloring effect appears. Increases in driving voltage cause the gradual conversion of W +6 states into W +6 states, which further leads to a more significant coloring effect. On the other hand, W-O-W deformed crystal lattice structures are also produced, which also affects the incidence of electrochromic property.

Original languageEnglish
Title of host publicationMaterials Processing Technology
Pages328-332
Number of pages5
DOIs
Publication statusPublished - 2012 Mar 14
Event2nd International Conference on Advances in Materials and Manufacturing, ICAMMP 2011 - Guilin, China
Duration: 2011 Dec 162011 Dec 18

Publication series

NameAdvanced Materials Research
Volume418-420
ISSN (Print)1022-6680

Other

Other2nd International Conference on Advances in Materials and Manufacturing, ICAMMP 2011
CountryChina
CityGuilin
Period11/12/1611/12/18

Fingerprint

Oxide films
Tungsten
Raman spectroscopy
Coloring
Thin films
Electric potential
Crystal lattices
Propylene
Sputtering
Flow of gases
Argon
Carbonates
Deposits
Electrolytes
Oxides
Oxygen
Substrates
Experiments

Keywords

  • Electrochromism
  • RF sputtering
  • Raman spectroscopy
  • Tungsten oxide

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Cheng, C. P., & Lin, S. H. (2012). Electrochromic properties and Raman spectroscopy analysis of tungsten oxide thin film by RF sputter. In Materials Processing Technology (pp. 328-332). (Advanced Materials Research; Vol. 418-420). https://doi.org/10.4028/www.scientific.net/AMR.418-420.328

Electrochromic properties and Raman spectroscopy analysis of tungsten oxide thin film by RF sputter. / Cheng, Chin Pao; Lin, Shi Hong.

Materials Processing Technology. 2012. p. 328-332 (Advanced Materials Research; Vol. 418-420).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Cheng, CP & Lin, SH 2012, Electrochromic properties and Raman spectroscopy analysis of tungsten oxide thin film by RF sputter. in Materials Processing Technology. Advanced Materials Research, vol. 418-420, pp. 328-332, 2nd International Conference on Advances in Materials and Manufacturing, ICAMMP 2011, Guilin, China, 11/12/16. https://doi.org/10.4028/www.scientific.net/AMR.418-420.328
Cheng, Chin Pao ; Lin, Shi Hong. / Electrochromic properties and Raman spectroscopy analysis of tungsten oxide thin film by RF sputter. Materials Processing Technology. 2012. pp. 328-332 (Advanced Materials Research).
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