Electrical characterization and dielectric properties of metal-oxide-semiconductor structures using high-K CeZrO4 ternary oxide as gate dielectric
- Pi Chun Juan*
- , Chuan Hsi Liu
- , Cheng Li Lin
- , Shin Chun Ju
- , Main Gwo Chen
- , Ingram Yin Ku Chanf
- , Jong Hong Lu
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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