Electrical characterization and dielectric properties of metal-oxide-semiconductor structures using high-K CeZrO4 ternary oxide as gate dielectric

Pi Chun Juan*, Chuan Hsi Liu, Cheng Li Lin, Shin Chun Ju, Main Gwo Chen, Ingram Yin Ku Chanf, Jong Hong Lu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Electrical characterization and dielectric properties of metal-oxide-semiconductor structures using high-K CeZrO4 ternary oxide as gate dielectric'. Together they form a unique fingerprint.

Material Science

INIS

Physics