Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90 nm node MOSFETs

H. W. Chen, S. Y. Chen, K. C. Chen, H. S. Huang, C. H. Liu, F. C. Chiu, K. W. Liu, K. C. Lin, L. W. Cheng, C. T. Lin, G. H. Ma, S. W. Sun

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