Engineering & Materials Science
Hafnium
100%
Atomic layer deposition
96%
MOSFET devices
73%
Silicates
72%
Characterization (materials science)
55%
Leakage currents
33%
Annealing
31%
Temperature
25%
Nitridation
24%
Oxide semiconductors
18%
Polysilicon
18%
Electric properties
16%
Thin films
14%
Oxides
13%
Capacitors
12%
Substrates
11%
Metals
10%
Physics & Astronomy
hafnium
78%
atomic layer epitaxy
65%
metal oxide semiconductors
64%
silicates
61%
field effect transistors
49%
leakage
39%
characterization
35%
traps
23%
injection
23%
annealing
18%
absorption cross sections
15%
capacitors
13%
pumping
13%
electrical properties
11%
temperature dependence
10%
oxides
9%
thin films
8%
temperature
4%
energy
4%
Chemical Compounds
Hafnium Atom
75%
Atomic Layer Epitaxy
72%
Field Effect
62%
Dielectric Material
55%
Interface Trap
52%
Leakage Current
41%
Charge Pumping
32%
Electric Field
28%
Annealing
24%
Capacitor
16%
Electrical Property
13%
Oxide
8%
Liquid Film
7%
Energy
7%