Effects of various ion-typed surfactants on silicon anisotropic etching properties in KOH and TMAH solutions
- Chii Rong Yang*
- , Po Ying Chen
- , Cheng Hao Yang
- , Yuang Cherng Chiou
- , Rong Tsong Lee
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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