Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography

T. L. Chang, F. Y. Chang, H. Y. Lin, W. L. Lai, J. H. Tsai, S. H. Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.

Original languageEnglish
Title of host publicationProceedings of the 35th International MATADOR 2007 Conference
Pages341-344
Number of pages4
Publication statusPublished - 2007 Dec 1
Externally publishedYes
Event35th International MATADOR 2007 Conference - Taipei, Taiwan
Duration: 2007 Jul 12007 Jul 1

Publication series

NameProceedings of the 35th International MATADOR 2007 Conference

Other

Other35th International MATADOR 2007 Conference
CountryTaiwan
CityTaipei
Period07/7/107/7/1

Keywords

  • Anti-Adhesive Layer
  • Nanoimprint lithography
  • Ni Stamp
  • PBO-SAM

ASJC Scopus subject areas

  • Mechanics of Materials

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