Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography

INIS

• molds 100%
• adhesives 100%
• methacrylates 75%
• surfaces 50%
• substrates 50%
• coatings 50%
• lead oxides 50%
• equipment 25%
• nanostructures 25%
• molecules 25%
• chemical vapor deposition 25%
• pitches 25%
• hydrogen 4 25%
• fluorine 25%

Engineering

• Nanoimprint Lithography 100%
• Hydrophobic 50%
• Nanomaterial 50%
• Forming Condition 50%
• Chemical Vapor Deposition 50%
• Vapor Deposition 50%
• Monolayer 50%
• Bottom-Up Approach 50%

Material Science

• Lithography 100%
• Surface (Surface Science) 100%
• Monolayers 50%
• Chemical Vapor Deposition 50%
• Nanostructure 50%