Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography

T. L. Chang, F. Y. Chang, H. Y. Lin, W. L. Lai, J. H. Tsai, S. H. Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution


A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.

Original languageEnglish
Title of host publicationProceedings of the 35th International MATADOR 2007 Conference
PublisherSpringer Science and Business Media, LLC
Number of pages4
ISBN (Print)9781846289873
Publication statusPublished - 2007
Externally publishedYes
Event35th International MATADOR 2007 Conference - Taipei, Taiwan
Duration: 2007 Jul 12007 Jul 1

Publication series

NameProceedings of the 35th International MATADOR 2007 Conference


Other35th International MATADOR 2007 Conference


  • Anti-Adhesive Layer
  • Nanoimprint lithography
  • Ni Stamp

ASJC Scopus subject areas

  • Mechanics of Materials


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