@inproceedings{fcb3efdf7f56438bb025be2f112e8f14,
title = "Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography",
abstract = "A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.",
keywords = "Anti-Adhesive Layer, Nanoimprint lithography, Ni Stamp, PBO-SAM",
author = "Chang, {T. L.} and Chang, {F. Y.} and Lin, {H. Y.} and Lai, {W. L.} and Tsai, {J. H.} and Chang, {S. H.}",
year = "2007",
doi = "10.1007/978-1-84628-988-0_77",
language = "English",
isbn = "9781846289873",
series = "Proceedings of the 35th International MATADOR 2007 Conference",
publisher = "Springer Science and Business Media, LLC",
pages = "341--344",
booktitle = "Proceedings of the 35th International MATADOR 2007 Conference",
note = "35th International MATADOR 2007 Conference ; Conference date: 01-07-2007 Through 01-07-2007",
}