Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography

T. L. Chang, F. Y. Chang, H. Y. Lin, W. L. Lai, J. H. Tsai, S. H. Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.

Original languageEnglish
Title of host publicationProceedings of the 35th International MATADOR 2007 Conference
Pages341-344
Number of pages4
Publication statusPublished - 2007 Dec 1
Externally publishedYes
Event35th International MATADOR 2007 Conference - Taipei, Taiwan
Duration: 2007 Jul 12007 Jul 1

Other

Other35th International MATADOR 2007 Conference
CountryTaiwan
CityTaipei
Period07/7/107/7/1

Fingerprint

Nanoimprint lithography
Polymethyl methacrylates
Adhesives
Coatings
Molds
Substrates
Chemical vapor deposition
Monolayers
Nanostructures
Molecules
Experiments

Keywords

  • Anti-Adhesive Layer
  • Nanoimprint lithography
  • Ni Stamp
  • PBO-SAM

ASJC Scopus subject areas

  • Mechanics of Materials

Cite this

Chang, T. L., Chang, F. Y., Lin, H. Y., Lai, W. L., Tsai, J. H., & Chang, S. H. (2007). Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography. In Proceedings of the 35th International MATADOR 2007 Conference (pp. 341-344)

Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography. / Chang, T. L.; Chang, F. Y.; Lin, H. Y.; Lai, W. L.; Tsai, J. H.; Chang, S. H.

Proceedings of the 35th International MATADOR 2007 Conference. 2007. p. 341-344.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chang, TL, Chang, FY, Lin, HY, Lai, WL, Tsai, JH & Chang, SH 2007, Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography. in Proceedings of the 35th International MATADOR 2007 Conference. pp. 341-344, 35th International MATADOR 2007 Conference, Taipei, Taiwan, 07/7/1.
Chang TL, Chang FY, Lin HY, Lai WL, Tsai JH, Chang SH. Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography. In Proceedings of the 35th International MATADOR 2007 Conference. 2007. p. 341-344
Chang, T. L. ; Chang, F. Y. ; Lin, H. Y. ; Lai, W. L. ; Tsai, J. H. ; Chang, S. H. / Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography. Proceedings of the 35th International MATADOR 2007 Conference. 2007. pp. 341-344
@inproceedings{4f836447474e493f9c6dce3b2eda60b9,
title = "Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography",
abstract = "A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90{\%} improvement in controlling quality and quantity.",
keywords = "Anti-Adhesive Layer, Nanoimprint lithography, Ni Stamp, PBO-SAM",
author = "Chang, {T. L.} and Chang, {F. Y.} and Lin, {H. Y.} and Lai, {W. L.} and Tsai, {J. H.} and Chang, {S. H.}",
year = "2007",
month = "12",
day = "1",
language = "English",
isbn = "9781846289873",
pages = "341--344",
booktitle = "Proceedings of the 35th International MATADOR 2007 Conference",

}

TY - GEN

T1 - Effects of mold pattern with anti-adhesive treatment in nanoimprint lithography

AU - Chang, T. L.

AU - Chang, F. Y.

AU - Lin, H. Y.

AU - Lai, W. L.

AU - Tsai, J. H.

AU - Chang, S. H.

PY - 2007/12/1

Y1 - 2007/12/1

N2 - A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.

AB - A study of a top-down technique of nanoimprint lithography (NIL) for developing a novel bottom-up approach of chemical vapor deposition to generate anti-adhesive coatings between Ni mold stamps and polymethyl methacrylate (PMMA ) substrate is presented in this work. A polybenzoxazine ((6,6'- bis(2,3-dihydro-3-methyl-4H-1,3-benzoxazinyl))) molecule selfassembled monolayer (PBO-SAM) regarded as an anti-adhesive coating agent demonstrates that non-fluorine-containing compounds can improve the nanoimprint process in Ni/PMMA substrates. In this experiment, the nanostructure-based Ni stamps and imprinted PMMA molds are fabricated using an electronbeam lithograph (EBL) and a homemade nanoimprint equipment, respectively. The diameter of pillar patterns obtained is 200 nm with 400 nm pitch on Ni stamp surface. Based on the hydrophobic PBO-SAM surface in this forming condition, the results of Ni mold stamps indicate over 90% improvement in controlling quality and quantity.

KW - Anti-Adhesive Layer

KW - Nanoimprint lithography

KW - Ni Stamp

KW - PBO-SAM

UR - http://www.scopus.com/inward/record.url?scp=84900582745&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84900582745&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84900582745

SN - 9781846289873

SP - 341

EP - 344

BT - Proceedings of the 35th International MATADOR 2007 Conference

ER -