Effects of lattice steps on atom dynamics, surface diffusion and epitaxial growth

Tien T. Tsong; Tsu Yi Fu

doi:10.1016/S0169-4332(97)00258-4

Effects of lattice steps on atom dynamics, surface diffusion and epitaxial growth

Tien T. Tsong^*, Tsu Yi Fu

^*Corresponding author for this work

Department of Physics

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

When an adatom encounters a lattice step, it can either be reflected or not reflected regardless of whether the step is a 'descending' or an 'ascending' step. These two types of steps are remarkably similar. In addition, lattice steps can act as atom-trap boundaries for diffusing atoms. Our FIM studies are briefly summarized. Based on our experimental data, we explain in simple terms that the 'high temperature' behavior of surface atoms and growth structures in thin film epitaxy are determined by the atom trapping property of the steps, whereas the 'low temperature' behavior and growth structures are determined by the reflection property of the steps.

Original language	English
Pages (from-to)	34-43
Number of pages	10
Journal	Applied Surface Science
Volume	121-122
DOIs	https://doi.org/10.1016/S0169-4332(97)00258-4
Publication status	Published - 1997 Nov

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
General Physics and Astronomy
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/S0169-4332(97)00258-4

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title = "Effects of lattice steps on atom dynamics, surface diffusion and epitaxial growth",

abstract = "When an adatom encounters a lattice step, it can either be reflected or not reflected regardless of whether the step is a 'descending' or an 'ascending' step. These two types of steps are remarkably similar. In addition, lattice steps can act as atom-trap boundaries for diffusing atoms. Our FIM studies are briefly summarized. Based on our experimental data, we explain in simple terms that the 'high temperature' behavior of surface atoms and growth structures in thin film epitaxy are determined by the atom trapping property of the steps, whereas the 'low temperature' behavior and growth structures are determined by the reflection property of the steps.",

author = "Tsong, {Tien T.} and Fu, {Tsu Yi}",

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AU - Tsong, Tien T.

AU - Fu, Tsu Yi

PY - 1997/11

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N2 - When an adatom encounters a lattice step, it can either be reflected or not reflected regardless of whether the step is a 'descending' or an 'ascending' step. These two types of steps are remarkably similar. In addition, lattice steps can act as atom-trap boundaries for diffusing atoms. Our FIM studies are briefly summarized. Based on our experimental data, we explain in simple terms that the 'high temperature' behavior of surface atoms and growth structures in thin film epitaxy are determined by the atom trapping property of the steps, whereas the 'low temperature' behavior and growth structures are determined by the reflection property of the steps.

AB - When an adatom encounters a lattice step, it can either be reflected or not reflected regardless of whether the step is a 'descending' or an 'ascending' step. These two types of steps are remarkably similar. In addition, lattice steps can act as atom-trap boundaries for diffusing atoms. Our FIM studies are briefly summarized. Based on our experimental data, we explain in simple terms that the 'high temperature' behavior of surface atoms and growth structures in thin film epitaxy are determined by the atom trapping property of the steps, whereas the 'low temperature' behavior and growth structures are determined by the reflection property of the steps.

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VL - 121-122

SP - 34

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JO - Applied Surface Science

JF - Applied Surface Science

ER -

Effects of lattice steps on atom dynamics, surface diffusion and epitaxial growth

Abstract

ASJC Scopus subject areas

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