Effects of lattice steps in surface diffusion and epitaxial growth

Tien T. Tsong*, Tsu Yi Fu, Chonglin Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


The lattice step is an integral part of a surface. We report a study of the behavior of atoms at and near lattice steps since this behavior plays an important role in epitaxial growth and in affecting the structure of the thin films, particularly grown from the vapor phase, and also the dynamic behavior of the surface at elevated temperature. We use Ir surfaces as our model system, and study self-diffusion on the terrace as well as along the step edges of the (001) and (111) surfaces using the field ion microscope. We also study the descending and ascending motion of diffusion atoms at lattice steps and the upward movement of in-layer atoms to the upper terrace.

Original languageEnglish
Pages (from-to)18-22
Number of pages5
JournalApplied Surface Science
Publication statusPublished - 1997 Apr
Externally publishedYes

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • General Physics and Astronomy
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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