@inproceedings{6a84ea51820347ad8251d5f9e08fd79f,
title = "Effects of H2 flow rate and H2 plasma treatment on the properties of AZO films",
abstract = "In this study, a 1350°C-sintered 98 mol\% ZnO-1 mol\% Al2O3 (AZO, Zn: Al= 98:2) ceramic was used as a target and deposited on glass using a r.f. magnetron sputtering system at a deposition temperature of 200°C. The effects of different H2 flow rates (H2/(H2+Ar)=0\% \textasciitilde{} 9.09\%, abbreviated as H2-deposited AZO films) added during the deposition process on the crystallization, resistivity, and optical transmission spectrum of AZO films were investigated. The Burstein-Moss shift effects were measured and used to prove that the defects of AZO films decreased with increasing H2 flow rate. For comparison, the 2\% H2-deposited AZO films were also treated by the H2 plasma at room temperature for 60 min (plasma-treated AZO films). The effects of H2 plasma on the properties of the H2-deposited AZO films were also studied. The value variations in the optical band gap (Eg) of the H2-deposited and plasma-treated AZO films were evaluated from the plots of (αhv)2 = c(hv-Eg).",
keywords = "AZO, H, Hydrogen flow rate, Optical band gap, Plasma",
author = "Kuo, \{C. G.\} and Li, \{C. L.\} and Huang, \{C. C.\} and Wang, \{F. H.\} and Yang, \{C. F.\} and Chen, \{I. C.\}",
year = "2013",
doi = "10.4028/www.scientific.net/AMR.813.447",
language = "English",
isbn = "9783037858530",
series = "Advanced Materials Research",
pages = "447--451",
booktitle = "Metallurgy Technology and Materials II",
note = "2nd International Conference on Metallurgy Technology and Materials, ICMTM 2013 ; Conference date: 25-06-2013 Through 26-06-2013",
}