INIS
films
100%
deposition
100%
substrates
100%
zirconium nitrides
100%
tungsten nitrides
100%
plasma
66%
surfaces
50%
nitrides
50%
wear
33%
tools
33%
roughness
33%
mechanical properties
33%
tungsten carbides
33%
values
16%
energy
16%
scanning electron microscopy
16%
glass
16%
oxygen
16%
gases
16%
x-ray diffraction
16%
flow rate
16%
spectroscopy
16%
etching
16%
metals
16%
machining
16%
thin films
16%
transmission electron microscopy
16%
hardness
16%
sputtering
16%
transition metals
16%
coatings
16%
compacts
16%
cutting tools
16%
direct current
16%
stainless steel-304
16%
Material Science
Nitride Compound
100%
Tungsten
66%
Film
66%
Surface Roughness
66%
Mechanical Property
66%
Carbide
66%
Surface
33%
Temperature
33%
Gas
33%
X-Ray Diffraction
33%
Scanning Electron Microscopy
33%
Metal
33%
Thin Films
33%
Coating
33%
Glass
33%
Hardness
33%
Machining
33%
Stainless Steel
33%
Transmission Electron Microscopy
33%
Cutting Tool
33%
Elastic Moduli
33%
Transition Metal
33%
Plasma Etching
33%
Taguchi Method
33%
Engineering
Deposition Parameter
100%
Flank Wear
66%
Dry Machining
33%
Metal Target
33%
Rate Deposition
33%
Ar Plasma
33%
Optimal Setting
33%