Effective surface impedance of a high-temperature superconducting film in semiconductor plasma substrate at mid-infrared frequency

Chien Jang Wu*, Yao Li Chen, Tzong Jer Yang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The effective surface impedance of a high-temperature superconducting thin film on a semiconductor plasma substrate is calculated. Two possible configurations are considered. The first one is a superconducting film deposited on a semi-infinite semiconductor substrate. It is seen that there exists a critical film thickness for the superconductor such that a minimum effective surface resistance is attained. The effective surface resistance is strongly dependent on the high-frequency permittivity of semiconductor plasma. The second will be limited to the more practical case, that is, the semiconductor substrate is of finite thickness. The investigation of substrate resonance in the effective surface resistance shows some fundamental distinctions when a semiconductor plasma substrate is introduced.

Original languageEnglish
Pages (from-to)545-550
Number of pages6
JournalJournal of Superconductivity and Novel Magnetism
Volume23
Issue number4
DOIs
Publication statusPublished - 2010 May

Keywords

  • High-temperature superconductors
  • Impedance transform technique
  • Semiconductor plasmas
  • Surface impedance

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Fingerprint

Dive into the research topics of 'Effective surface impedance of a high-temperature superconducting film in semiconductor plasma substrate at mid-infrared frequency'. Together they form a unique fingerprint.

Cite this