Effect of Ta2O5 doping on electrical characteristics of SrTiO3 metal-insulator-metal capacitors

Ching Chien Huang*, Chun Hu Cheng, Bo Heng Liou, Fon Shan Yeh, Albert Chin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

The effect of Ta2O5 doping on electrical characteristics of SrTiO3 (STO) metal-insulator-metal (MIM) capacitors was studied for the first time. Using Ta2O5-doped STO dielectrics, an absolute quadratic voltage coefficient of capacitance (VCC-α) of 510ppm/V2 and a high capacitance density of ̃20fF/μm 2 are achieved. These are approximately one order of magnitude lower than those of the MIM capacitor fabricated using a pure STO. In addition, the degradation of electrical properties (capacitance variation versus voltage, VCC-α, and longterm reliability) after electrical stressing is reduced, compared with that of an MIM capacitor fabricated using a pure STO.

Original languageEnglish
Pages (from-to)814011-814016
Number of pages6
JournalJapanese Journal of Applied Physics
Volume48
Issue number8 Part 1
DOIs
Publication statusPublished - 2009
Externally publishedYes

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy

Fingerprint

Dive into the research topics of 'Effect of Ta2O5 doping on electrical characteristics of SrTiO3 metal-insulator-metal capacitors'. Together they form a unique fingerprint.

Cite this