Effect of processing parameters on the nucleation behavior of nano-crystalline diamond film

Y. C. Lee, S. J. Lin, C. T. Chia, H. F. Cheng, I. N. Lin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


The nucleation behavior of nanodiamond films and the associated electron field emission properties were investigated. Among the important CVD parameters, the methane/hydrogen ratio and the total pressure impose most markedly effect, whereas the microwave power and the boron content show least significant effect on the nucleation behavior for the nanodiamonds. Presumably, the prime factor modifying the rate of formation of diamond nuclei is the proportion of C +- and H+-species contained in the plasma. The bias voltage applied for nucleation of diamonds show more marked effect on improving the electron field emission capacity for the nanodiamonds than the boron-content does. It is ascribed to the increase in proportion of grain boundaries, as the grain boundaries are highly conductive and are good emission sites.

Original languageEnglish
Pages (from-to)296-301
Number of pages6
JournalDiamond and Related Materials
Issue number3-7
Publication statusPublished - 2005 Mar


  • Bias enhanced nucleation and growth
  • Electron field emission
  • Nanodiamond

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • General Chemistry
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering


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