INIS
concentration
100%
randomness
100%
oxygen
100%
nickel oxides
66%
height
33%
instability
33%
films
33%
barriers
33%
operation
33%
emission
33%
temperature range 0273-0400 k
33%
voltage
33%
dielectric constant
33%
Physics
Oxygen
100%
Nickel
100%
Memory
100%
Ratios
50%
Room Temperature
50%
Oxide
50%
Emission
50%
Electric Potential
50%
Cycles
50%
Material Science
Nickel
100%
Material
50%
Temperature
50%
Oxide
50%
Electrical Property
50%
Permittivity
50%
Durability
50%
Oxide Film
50%
Chemistry
Dioxygen
100%
Concentration
100%
Resistance
100%
Oxide
40%
Ambient Reaction Temperature
20%
Liquid Film
20%
Voltage
20%
Dielectric Constant
20%
Engineering
Oxygen Concentration
100%
Random Access Memory
100%