Abstract
Controllable quantized conductance states of TiN/Ti/HfOx/TiN memristors are realized with great precision through a pulse-mode reset procedure, assisted with analytical differentiation of the conditions of the set procedure, which involves critical monitoring of the measured bias voltage. An intriguing training effect that leads to faster switching of the states is also observed during the operation. Detailed analyses of the low- and high-resistance states under different compliance currents reveal a complete picture of the structural evolution and dynamic behaviors of the conductive filament in the HfOx layer. This study provides a closer inspection on the quantum-level manipulation of nanoscale atomic configurations in the memristors, which helps to develop essential knowledge about the design and fabrication of the future memristor-based quantum devices and neuromorphic computing devices.
Original language | English |
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Pages (from-to) | 11296-11304 |
Number of pages | 9 |
Journal | ACS Applied Nano Materials |
Volume | 4 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2021 Oct 22 |
Keywords
- HfO
- conductance quantization
- filament
- memristor
- oxygen vacancy
- resistive random-access memory (RRAM)
- resistive switching
- training effect
ASJC Scopus subject areas
- General Materials Science