Dual-Mode GaN MOS-HEMT of Cascode Configuration with Si Ferroelectric Hf1-xZrxO2FET

C. Y. Liao, K. Y. Hsiang, Z. F. Lou, C. Y. Lin, W. C. Ray, F. S. Chang, C. C. Wang, Z. X. Li, H. C. Tseng, J. Y. Lee, P. H. Chen, J. H. Tsai, P. G. Chen*, M. H. Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The dual-mode (D-mode & E-mode) GaN MOS-HEMT is achieved simultaneously by a Cascode configuration with Si ferroelectric (FE) FET. Due to hole absence in 2DEG of GaN HEMT, the conventional FE-gate stack on GaN is difficult to obtain FE-hysteresis with dipole switching in FE-layer. The proposed method is a solution to accomplish ferroelectric hysteresis for modulated modes of GaN-FET.

Original languageEnglish
Title of host publication2022 IEEE Silicon Nanoelectronics Workshop, SNW 2022
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665459792
DOIs
Publication statusPublished - 2022
Event2022 IEEE Silicon Nanoelectronics Workshop, SNW 2022 - Honolulu, United States
Duration: 2022 Jun 112022 Jun 12

Publication series

Name2022 IEEE Silicon Nanoelectronics Workshop, SNW 2022

Conference

Conference2022 IEEE Silicon Nanoelectronics Workshop, SNW 2022
Country/TerritoryUnited States
CityHonolulu
Period2022/06/112022/06/12

Keywords

  • Cascode
  • E-mode
  • Ferroelectric
  • GaN HEMT

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Safety, Risk, Reliability and Quality
  • Electronic, Optical and Magnetic Materials

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