Diffusion and elementary atomic processes at steeped surfaces

Tien T. Tsong; Tsu Yi Fu

doi:10.1016/S0079-6816(96)00021-4

Diffusion and elementary atomic processes at steeped surfaces

Tien T. Tsong^*, Tsu Yi Fu

^*Corresponding author for this work

4 Citations (Scopus)

Abstract

The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.

Original language	English
Pages (from-to)	233-239
Number of pages	7
Journal	Progress in Surface Science
Volume	53
Issue number	2-4
DOIs	https://doi.org/10.1016/S0079-6816(96)00021-4
Publication status	Published - 1996
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/S0079-6816(96)00021-4

Cite this

@article{55a1f72c4fe5426197cf6adbe8d5d719,

title = "Diffusion and elementary atomic processes at steeped surfaces",

abstract = "The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.",

author = "Tsong, {Tien T.} and Fu, {Tsu Yi}",

year = "1996",

doi = "10.1016/S0079-6816(96)00021-4",

language = "English",

volume = "53",

pages = "233--239",

journal = "Progress in Surface Science",

issn = "0079-6816",

publisher = "Elsevier Limited",

number = "2-4",

}

TY - JOUR

T1 - Diffusion and elementary atomic processes at steeped surfaces

AU - Tsong, Tien T.

AU - Fu, Tsu Yi

PY - 1996

Y1 - 1996

N2 - The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.

AB - The mobility of atoms at and near lattice step edges plays an important role in epitaxial growth and surface morphology of thin films, and the dynamic behavior of surfaces at elevated temperature. We summarize our recent FIM studies on how atoms move and bind at step edges, how atoms can descend and ascend lattice steps, how in-layer atoms can move up to the upper terrace, and how these atomic processes are related to various growth structures in thin film epitaxy.

UR - http://www.scopus.com/inward/record.url?scp=0030257139&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030257139&partnerID=8YFLogxK

U2 - 10.1016/S0079-6816(96)00021-4

DO - 10.1016/S0079-6816(96)00021-4

M3 - Article

AN - SCOPUS:0030257139

SN - 0079-6816

VL - 53

SP - 233

EP - 239

JO - Progress in Surface Science

JF - Progress in Surface Science

IS - 2-4

ER -

Diffusion and elementary atomic processes at steeped surfaces

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this