Diffractive optical element designed by use of an irregular etching-depth sequence

Chung J. Kuo, Hung C. Chien, Ni Y. Chang, Chia H. Yeh

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In fabricating a diffractive optical element the ratio of the etching depth between the (n - 1)th and the nth mask is usually 1(2). We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1(2)) is not kept constant. For achieving this improvement the difference between the desired and the actual diffraction pattern is also used as an objective function for phase quantization.

Original languageEnglish
Pages (from-to)5894-5897
Number of pages4
JournalApplied Optics
Volume40
Issue number32
DOIs
Publication statusPublished - 2001 Nov 10
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Diffractive optical element designed by use of an irregular etching-depth sequence'. Together they form a unique fingerprint.

Cite this