Design of ESD protection cell for dual-band RF applications in a 65-nm CMOS process

Li Wei Chu*, Chun Yu Lin, Shiang Yu Tsai, Ming Dou Ker, Ming Hsiang Song, Chewn Pu Jou, Tse Hua Lu, Jen Chou Tseng, Ming Hsien Tsai, Tsun Lai Hsu, Ping Fang Hung, Tzu Heng Chang, Yu Lin Wei

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An ESD protection cell consisted of a diode, a silicon-controlled rectifier SCR a PMOS, and inductors was proposed for dual-band radio-frequency RFESD protection. The proposed ESD protection cell was suitable for RF circuit designers for them to easily apply ESD protection in the dual-band RF circuits.

Original languageEnglish
Title of host publicationElectrical Overstress/Electrostatic Discharge Symposium Proceedings 2012, EOS/ESD 2012
Publication statusPublished - 2012
Externally publishedYes
Event34th International Electrical Overstress/Electrostatic Discharge Symposium, EOS/ESD 2012 - Tucson, AZ, United States
Duration: 2012 Sept 92012 Sept 14

Publication series

NameElectrical Overstress/Electrostatic Discharge Symposium Proceedings
ISSN (Print)0739-5159

Other

Other34th International Electrical Overstress/Electrostatic Discharge Symposium, EOS/ESD 2012
Country/TerritoryUnited States
CityTucson, AZ
Period2012/09/092012/09/14

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Design of ESD protection cell for dual-band RF applications in a 65-nm CMOS process'. Together they form a unique fingerprint.

Cite this