Current conduction of 0.72 nm equivalent-oxide-thickness LaO/HfO 2 stacked gate dielectrics

Chuan Hsi Liu*, Hung Wen Chen, Shung Yuan Chen, Heng Sheng Huang, Li Wei Cheng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

34 Citations (Scopus)

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Physics & Astronomy