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Dive into the research topics of 'Current conduction of 0.72 nm equivalent-oxide-thickness LaO/HfO 2 stacked gate dielectrics'. Together they form a unique fingerprint.- Sort by
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Chuan Hsi Liu*, Hung Wen Chen, Shung Yuan Chen, Heng Sheng Huang, Li Wei Cheng
Research output: Contribution to journal › Article › peer-review