Cr-doped ZnO prepared by electrochemical deposition

C. J. Lan, J. S. Tsay, C. K. Lo, C. A. Lin, J. H. He, R. J. Chung

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

This study demonstrated the preparation of a Cr-doped ZnO wurtzite structure without any impurity phases (metallic Zn, Cr, Zn(OH)2, ZnCrO4, etc.) via electrodeposition. The surface morphology, lattice structure, Cr content, chemical binding characteristics, and optical properties of the deposits were examined by field-emission-scanning electron microscopy, X-ray diffraction, inductive coupled plasma mass spectroscopy, X-ray photoelectron spectroscopy, UV-visible spectroscopy, and photoluminescence, respectively. Cr-doped ZnO in the shape of hexangular columns appears when the applied potential is equal to or more positive than -1.2 VSSCE. The thickness of the deposits was within the range of 1.07-2.25 μm. Cr was in its trivalent state in the ZnO lattice. Both the high concentration of Cr ions in baths and the more negative applied potential impede the formation of the ZnO(002) plane. The redshift of the bandgap of the deposits from 3.31 to 3.18 eV occurs after the introduction of Cr impurity into the ZnO lattice. The photoluminescence results show both UV and visible light emissions from the electrodeposited specimens.

Original languageEnglish
Pages (from-to)D559-D563
JournalJournal of the Electrochemical Society
Volume157
Issue number11
DOIs
Publication statusPublished - 2010 Oct 13

Fingerprint

Deposits
deposits
Photoluminescence
Spectroscopy
Impurities
photoluminescence
impurities
Light emission
Electrodeposition
electrodeposition
wurtzite
Field emission
Surface morphology
light emission
field emission
baths
Energy gap
x rays
mass spectroscopy
X ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

Cr-doped ZnO prepared by electrochemical deposition. / Lan, C. J.; Tsay, J. S.; Lo, C. K.; Lin, C. A.; He, J. H.; Chung, R. J.

In: Journal of the Electrochemical Society, Vol. 157, No. 11, 13.10.2010, p. D559-D563.

Research output: Contribution to journalArticle

Lan, C. J. ; Tsay, J. S. ; Lo, C. K. ; Lin, C. A. ; He, J. H. ; Chung, R. J. / Cr-doped ZnO prepared by electrochemical deposition. In: Journal of the Electrochemical Society. 2010 ; Vol. 157, No. 11. pp. D559-D563.
@article{4165cf08ad064d90857e10a4c2691daf,
title = "Cr-doped ZnO prepared by electrochemical deposition",
abstract = "This study demonstrated the preparation of a Cr-doped ZnO wurtzite structure without any impurity phases (metallic Zn, Cr, Zn(OH)2, ZnCrO4, etc.) via electrodeposition. The surface morphology, lattice structure, Cr content, chemical binding characteristics, and optical properties of the deposits were examined by field-emission-scanning electron microscopy, X-ray diffraction, inductive coupled plasma mass spectroscopy, X-ray photoelectron spectroscopy, UV-visible spectroscopy, and photoluminescence, respectively. Cr-doped ZnO in the shape of hexangular columns appears when the applied potential is equal to or more positive than -1.2 VSSCE. The thickness of the deposits was within the range of 1.07-2.25 μm. Cr was in its trivalent state in the ZnO lattice. Both the high concentration of Cr ions in baths and the more negative applied potential impede the formation of the ZnO(002) plane. The redshift of the bandgap of the deposits from 3.31 to 3.18 eV occurs after the introduction of Cr impurity into the ZnO lattice. The photoluminescence results show both UV and visible light emissions from the electrodeposited specimens.",
author = "Lan, {C. J.} and Tsay, {J. S.} and Lo, {C. K.} and Lin, {C. A.} and He, {J. H.} and Chung, {R. J.}",
year = "2010",
month = "10",
day = "13",
doi = "10.1149/1.3481408",
language = "English",
volume = "157",
pages = "D559--D563",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "11",

}

TY - JOUR

T1 - Cr-doped ZnO prepared by electrochemical deposition

AU - Lan, C. J.

AU - Tsay, J. S.

AU - Lo, C. K.

AU - Lin, C. A.

AU - He, J. H.

AU - Chung, R. J.

PY - 2010/10/13

Y1 - 2010/10/13

N2 - This study demonstrated the preparation of a Cr-doped ZnO wurtzite structure without any impurity phases (metallic Zn, Cr, Zn(OH)2, ZnCrO4, etc.) via electrodeposition. The surface morphology, lattice structure, Cr content, chemical binding characteristics, and optical properties of the deposits were examined by field-emission-scanning electron microscopy, X-ray diffraction, inductive coupled plasma mass spectroscopy, X-ray photoelectron spectroscopy, UV-visible spectroscopy, and photoluminescence, respectively. Cr-doped ZnO in the shape of hexangular columns appears when the applied potential is equal to or more positive than -1.2 VSSCE. The thickness of the deposits was within the range of 1.07-2.25 μm. Cr was in its trivalent state in the ZnO lattice. Both the high concentration of Cr ions in baths and the more negative applied potential impede the formation of the ZnO(002) plane. The redshift of the bandgap of the deposits from 3.31 to 3.18 eV occurs after the introduction of Cr impurity into the ZnO lattice. The photoluminescence results show both UV and visible light emissions from the electrodeposited specimens.

AB - This study demonstrated the preparation of a Cr-doped ZnO wurtzite structure without any impurity phases (metallic Zn, Cr, Zn(OH)2, ZnCrO4, etc.) via electrodeposition. The surface morphology, lattice structure, Cr content, chemical binding characteristics, and optical properties of the deposits were examined by field-emission-scanning electron microscopy, X-ray diffraction, inductive coupled plasma mass spectroscopy, X-ray photoelectron spectroscopy, UV-visible spectroscopy, and photoluminescence, respectively. Cr-doped ZnO in the shape of hexangular columns appears when the applied potential is equal to or more positive than -1.2 VSSCE. The thickness of the deposits was within the range of 1.07-2.25 μm. Cr was in its trivalent state in the ZnO lattice. Both the high concentration of Cr ions in baths and the more negative applied potential impede the formation of the ZnO(002) plane. The redshift of the bandgap of the deposits from 3.31 to 3.18 eV occurs after the introduction of Cr impurity into the ZnO lattice. The photoluminescence results show both UV and visible light emissions from the electrodeposited specimens.

UR - http://www.scopus.com/inward/record.url?scp=77957702261&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77957702261&partnerID=8YFLogxK

U2 - 10.1149/1.3481408

DO - 10.1149/1.3481408

M3 - Article

AN - SCOPUS:77957702261

VL - 157

SP - D559-D563

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 11

ER -