Correlation between Si-H/D bond desorption and injected electron energy in metal-oxide-silicon tunneling diodes

C. H. Lin, Min-Hung Lee, C. W. Liu

    Research output: Contribution to journalArticlepeer-review

    10 Citations (Scopus)

    Abstract

    Metal-oxide-silicon tunneling diodes with SiO2/Si interface passivated by hydrogen or deuterium are stressed under various constant current conditions. When the energy of injected electrons exceeds a threshold value (∼3 eV), both hydrogen and deuterium passivated devices reveal similar soft breakdown behaviors. On the contrary, when the injected electrons with low energy (<3 eV) at high current density stress, a giant isotope effect is observed in the deuterated devices due to the resonance between the Si-D bond bending mode and the transverse optical phonon of bulk silicon.

    Original languageEnglish
    Pages (from-to)637-639
    Number of pages3
    JournalApplied Physics Letters
    Volume78
    Issue number5
    DOIs
    Publication statusPublished - 2001 Jan 29

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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