Correlation between ferroelectricity and nitrogen incorporation of undoped hafnium dioxide thin films

Jun Dao Luo, Yun Tien Yeh, Yu Ying Lai, Chia Feng Wu, Hao Tung Chung, Yi Shao Li, Kai Chi Chuang, Wei Shuo Li, Pin Guang Chen, Min Hung Lee, Huang Chung Cheng

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    Chemical Compounds

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