Correlation between ferroelectricity and nitrogen incorporation of undoped hafnium dioxide thin films

Jun Dao Luo*, Yun Tien Yeh, Yu Ying Lai, Chia Feng Wu, Hao Tung Chung, Yi Shao Li, Kai Chi Chuang, Wei Shuo Li, Pin Guang Chen, Min Hung Lee, Huang Chung Cheng

*Corresponding author for this work

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Engineering & Materials Science

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Chemical Compounds